发明名称 SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT CHIP
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a semiconductor device capable of suppressing the increase of a period of time needed for dicing even when the number of wiring layers increases, and to provide a method of manufacturing the semiconductor integrated circuit chip. <P>SOLUTION: Chip areas 22 and 23, and a scribing area 21 provided between the chip areas 22 and 23 are provided. Then the scribing area 21 includes metal films 11 and 12 differing in distance from a surface of a semiconductor substrate 1, and the metal films 11 and 12 shift in position in a direction parallel to the surface of the semiconductor substrate 1. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010129970(A) 申请公布日期 2010.06.10
申请号 JP20080306509 申请日期 2008.12.01
申请人 FUJITSU MICROELECTRONICS LTD 发明人 HARA AKIO;SAWADA TOYOJI;KOYASHIKI TAKESHI;FUKAYA HIRONORI
分类号 H01L21/301;B23K26/00;B23K26/18 主分类号 H01L21/301
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