发明名称 |
SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT CHIP |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a semiconductor device capable of suppressing the increase of a period of time needed for dicing even when the number of wiring layers increases, and to provide a method of manufacturing the semiconductor integrated circuit chip. <P>SOLUTION: Chip areas 22 and 23, and a scribing area 21 provided between the chip areas 22 and 23 are provided. Then the scribing area 21 includes metal films 11 and 12 differing in distance from a surface of a semiconductor substrate 1, and the metal films 11 and 12 shift in position in a direction parallel to the surface of the semiconductor substrate 1. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
申请公布号 |
JP2010129970(A) |
申请公布日期 |
2010.06.10 |
申请号 |
JP20080306509 |
申请日期 |
2008.12.01 |
申请人 |
FUJITSU MICROELECTRONICS LTD |
发明人 |
HARA AKIO;SAWADA TOYOJI;KOYASHIKI TAKESHI;FUKAYA HIRONORI |
分类号 |
H01L21/301;B23K26/00;B23K26/18 |
主分类号 |
H01L21/301 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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