发明名称 |
TARGET SUPPLY UNIT OF EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS AND METHOD OF MANUFACTURING THE SAME |
摘要 |
In a target supply unit of an extreme ultraviolet light source apparatus for generating extreme ultraviolet light by applying a laser beam to a target material to turn the target material into plasma, clogging of a target nozzle for supplying the target material to a laser beam application point is suppressed. The target supply unit includes: a target container for accommodating the target material; a target nozzle for injecting the target material supplied from the target container; and a reducing gas supply unit for supplying a reducing gas into the target container. Instead of using the reducing gas, a carbon-based material having a reduction action may be provided within the target container for causing reduction reaction.
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申请公布号 |
US2010143202(A1) |
申请公布日期 |
2010.06.10 |
申请号 |
US20090581461 |
申请日期 |
2009.10.19 |
申请人 |
YABU TAKAYUKI;ISHIHARA TAKANOBU;NAKANO MASAKI |
发明人 |
YABU TAKAYUKI;ISHIHARA TAKANOBU;NAKANO MASAKI |
分类号 |
G05D7/00;B23P11/00 |
主分类号 |
G05D7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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