| 摘要 |
<p>PURPOSE: A resist protective film composition and a method for forming a pattern using the same are provided to obtain excellent transparency to radiation having a wavelength less than 200 nm and to prevent water from being permeated. CONSTITUTION: A resist protective film composition includes a polymer having a repeating unit which is marked as a chemical formula 1. In the chemical formula 1, R^1 is a hydrogen atom, a methyl group, or trifluoromethyl group. R^2a and R^2b are hydrogen atoms or a linear, branched, or cyclic alkyl group having carbon number of 1 ~ 15. R^2a and R^2b are capable of forming a ring by being combined. R^3 is a single bond or a linear, branched, or cycling alkylene group having carbon number of 1 ~ 15.</p> |
