发明名称 SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device having a structure which suppresses an increase in contact resistance even when a columnar semiconductor layer is microfabricated and highly integrated. SOLUTION: The semiconductor device includes a substrate (semiconductor substrate 1), a semiconductor columnar part (columnar semiconductor layer 3) provided on the semiconductor substrate 1, a contact columnar part (contact layer 7) provided in contact with a top surface of the semiconductor columnar part and having a diameter equal to or smaller than that of the columnar semiconductor layer 3, and a recessed part provided on the top surface. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010129686(A) 申请公布日期 2010.06.10
申请号 JP20080301225 申请日期 2008.11.26
申请人 RENESAS ELECTRONICS CORP 发明人 NARUHIRO MITSURU
分类号 H01L21/768;H01L21/28;H01L23/522;H01L29/423;H01L29/49;H01L29/78;H01L29/786 主分类号 H01L21/768
代理机构 代理人
主权项
地址