发明名称 MICRO SHUTTER DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 A micro shutter device and a method of manufacturing the micro shutter device are provided. A transparent substrate is provided. A barrier is formed on the substrate to partition a unit pixel. A pattern layer is formed with a transparent material to have a transparent first pattern portion on the substrate in the unit pixel. A movable plate is arranged to face the pattern layer, has an opaque second pattern layer corresponding to a shape of the first pattern portion, and is configured to transmit light therethrough except the second pattern portion. An actuator is for moving the movable plate. Therefore, light leakage due to diffraction can be prevented, resulting in increasing contrast ratio and improving light efficiency.
申请公布号 US2010142024(A1) 申请公布日期 2010.06.10
申请号 US20090539255 申请日期 2009.08.11
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM CHE-HEUNG
分类号 G02B26/02;B05D5/06 主分类号 G02B26/02
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