| 摘要 |
A process flow for creating a non-volatile memory cell, the process flow including the steps of forming a doped well in a semiconducting portion of a substrate, forming a gate dielectric layer on top of the substrate, depositing a first polysilicon layer on top of the gate dielectric layer, patterning and etching the first polysilicon layer, selectively oxidizing the first polysilicon layer, implanting lightly-doped source/drain regions into the well, forming sidewall spacers adjacent the first polysilicon layer, implanting source/drain regions into the well, thereby forming a channel area, depositing a dielectric layer on top of the first polysilicon layer, depositing a second polysilicon layer on top of the dielectric layer, forming a masking layer on the second polysilicon layer, and etching both the second polysilicon layer and the dielectric layer using the masking layer.
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