发明名称 PROCESSING DEVICE AND IONIZED-AIR SUPPLY PROGRAM
摘要 PROBLEM TO BE SOLVED: To sufficiently spray ionized air in carrying in/out of a wafer (workpiece) to/from a cassette, and to reliably eliminate static electricity generated in the carrying in/out. SOLUTION: An upper and lower pair of blowing nozzles 37A and 37B for jetting air are installed in a block 36 in which a clamp 33 for holding a frame 4 of a first conveying means 30 for carrying in/out a frame 6 with a wafer to/from a cassette 9 is provided, and an ionized-air generating means 73 is arranged in the block 36. A wafer 1 is carried in or carried out while ionized air is sprayed on upper and lower surfaces of the wafer 1 from the blowing nozzles 37A and 37B to eliminate static electricity. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010129776(A) 申请公布日期 2010.06.10
申请号 JP20080302884 申请日期 2008.11.27
申请人 DISCO ABRASIVE SYST LTD 发明人 HATTORI ATSUSHI
分类号 H01L21/677 主分类号 H01L21/677
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