Method for depositing a layer on a substrate, comprises producing flame from a process gas, supplying two fluid or gaseous precursor materials to the process gas and/or the flame and then subjected to reaction

摘要

The method comprises producing flame from a process gas (A), supplying two fluid or gaseous precursor materials to the process gas and/or the flame and then subjected to reaction. A reaction product of the precursor materials is deposited on a surface of a substrate (2) and/or on a layer arranged on the surface as multi-component layer (M) in a coating process. The multicomponent layer is deposited with a layer thickness of 1-100 nm, where three coating processes are carried out. A multicomponent layer system is deposited with a total layer thickness of 200 nm. The method comprises producing flame from a process gas (A), supplying two fluid or gaseous precursor materials to the process gas and/or the flame and then subjected to reaction. A reaction product of the precursor materials is deposited on a surface of a substrate (2) and/or on a layer arranged on the surface as multi-component layer (M) in a coating process. The multicomponent layer is deposited with a layer thickness of 1-100 nm, where three coating processes are carried out. A multicomponent layer system is deposited with a total layer thickness of 200 nm. The substrate is glass, plastic, metal, wood, textile, natural material, ceramics, stone or hybrid material of two of prementioned substances. The precursor materials are mixed with one another before they are supplied to the process gas or the flame. The precursor materials are supplied separately to the process gas or the flame in a multichamber burner (1). In the coating process, the multichamber burner is moved relative to the surface of the substrate and the layers are deposited directly one after the other from the flames directly adjoining to one another. The layers permeate one another for forming a multicomponent layer. The multicomponent layer is deposited in the form of a doped layer in which a portion of one of the components is greater than the other portion of the component. The process is carried out at atmospheric pressure. The precursor is transferred in gaseous condition before supplying to the process gas or the flame. A gas or aerosol is used as process gas. A throughput of the process gas and/or the precursor is controlled and/or regulated and a ratio of the portion of precursor materials is controlled and/or regulated. The deposition takes place directly in the connection at manufacturing process of the substrate in which the substrate is formed under heat supply. The multicomponent layer or the multicomponent layer system is deposited with a roughness of 1-100 nm.