发明名称
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a laser etching apparatus capable of freely controlling a working shape. <P>SOLUTION: When a slope is desired for example with a width of 5μm on the side wall face at an end part in the scanning direction, an opening 41 is started to be opened from a state opened by the initial dimension of 5μm, with the rear end of the opening 41 adjusted to a scanning starting position P1, and with laser beam irradiation started simultaneously, until the opening reaches a target dimension of 10μm SQUARE. In this instance, a controller makes the opening 41 open at a speed of 5μm/sec and scan the laser beam at a speed of 7.5μm/sec. Then, with the opening 41 maintained at the target dimension of 10μm SQUARE, the laser beam is scanned at a speed of 10μm/sec. When the tip end of the opening 41 reaches 5 mm before the scanning terminating position P2, the opening 41 is started to be closed. When the opening 41 is closed to the initial dimension of 5 mm, the irradiation of the laser beam LB is stopped at the same time. Concurrently, the controller 70 makes the opening 41 close at the speed of 5μm/sec while making the laser beam scan at the speed of 7.5μm/sec. <P>COPYRIGHT: (C)2007,JPO&INPIT</p>
申请公布号 JP4479556(B2) 申请公布日期 2010.06.09
申请号 JP20050089830 申请日期 2005.03.25
申请人 发明人
分类号 B23K26/00;B23K26/06;B23K26/08;B23K101/42;G02B27/09 主分类号 B23K26/00
代理机构 代理人
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