| 摘要 |
A method of mass spectrometry comprising a) depositing an aqueous sample onto a semiconductor wafer 12 comprising a first surface 13 and plural second surfaces 14 which are surrounded by the first surface, where the second surfaces are formed by partial destruction of the first surface. The second surfaces are more hydrophilic than the first surface, and the first surface is more hydrophobic than the second surfaces so that upon application of aqueous sample to the first surface, the sample is directed towards and concentrated at the second surfaces; b) irradiating the sample, preferably by a CO2laser 16, to create sample ions; and c) analyzing the sample ions with a mass spectrometer 17. The mass spectrometry method is preferably MALDI or DIOS. The second surfaces may be oxidized by ozone, and may be formed by heat treatment, chemical or enzyme treatment, or preferably laser ablation. The first surface may be functionalized with a silane, preferably (tridecafluoro-1,1,2,2- tetrahydrooctyl)dimethylchlorosilane, and the second surface may be functionalized with a hydrogen atom or hydroxyl moiety. |
