| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a three-dimensional exposure mask and a three-dimensional exposure method by which three-dimensional exposure can be performed in a short exposure time and many conventional exposure techniques and/or devices can be diverted. Ž<P>SOLUTION: The three-dimensional exposure mask 1 is used for pattern exposure of a printed wiring board 6 in the form of a three-dimensional sculptured surface and comprises: a microlens array 2 to condense the light from a collimated light source 8 for exposure; a mask layer 3 to correct the optical axis and composed of a core material 3a which is disposed along the pattern to be formed on the printed wiring board 6 and transmits the light and of a clad material 3b which is disposed in other part and does not transmit the light; and a holding base 4 to hold the mask layer. The surface of the mask opposing to the printed wiring board 6 is formed into a three-dimensional sculptured surface corresponding to the form of the exposure face of the printed wiring board 6. Ž<P>COPYRIGHT: (C)2006,JPO&NCIPI Ž</p> |
