发明名称 Photosensitive self-assembled monolayer for selective placement of hydrophilic structures
摘要 A photosensitive monolayer is self-assembled on an oxide surface. The chemical compound of the photosensitive monolayer has three components. A first end group provides covalent bonds with the oxide surface for self assembly on the oxide surface. A photosensitive group that dissociates upon exposure to ultraviolet radiation is linked to the first end group. A second end group linked to the photosensitive group provides hydrophobicity. Upon exposure to the ultraviolet radiation, the dissociated photosensitive group is cleaved and forms a hydrophilic derivative in the exposed region, rendering the exposed region hydrophilic. Carbon nanotubes or nanocrystals applied in an aqueous dispersion are selectively attracted to the hydrophilic exposed region to from electrostatic bonding with the hydrophilic surface of the cleaved photosensitive group.
申请公布号 US7732119(B2) 申请公布日期 2010.06.08
申请号 US20070870167 申请日期 2007.10.10
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 AFZALI-ARDAKANI ALI;GRAHAM TERESITA O.;HANNON JAMES B.;TULEVSKI GEORGE S.
分类号 G03F7/00;G03F7/004;G03F7/20 主分类号 G03F7/00
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