发明名称 |
Apparatus for coating photoresist material |
摘要 |
An apparatus for providing a photoresist material onto a substrate includes a lid housing at least one nozzle. A solvent supplying port inputs the solvent into the apparatus. A first solvent trap is provided below the nozzle and coupled to the solvent supplying port to hold a given amount of the solvent being input from the solvent supplying port. The first solvent trap is configured to prevent photoresist residues on the nozzle from being converted to powders. A second solvent trap is provided below the first solvent trap to receive the solvent from the first solvent trap. A solvent path is provided between the solvent trap and the solvent container to guide the solvent from the first solvent trap to the second solvent trap.
|
申请公布号 |
US7730849(B2) |
申请公布日期 |
2010.06.08 |
申请号 |
US20060399875 |
申请日期 |
2006.04.07 |
申请人 |
HYNIX SEMICONDUCTOR INC. |
发明人 |
JUNG HUN ROCK;KIM HEE SUNG |
分类号 |
B05B15/02;B05B3/00;B05C11/02 |
主分类号 |
B05B15/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|