发明名称 Pattern formed structure, method of forming pattern, device, electrooptical device and electronic equipment
摘要 A partition-wall structure having a concave portion corresponding to a pattern formed by a functional liquid, including: a first concave portion provided corresponding to a first pattern; a second concave portion provided corresponding to a second pattern that is coupled to the first pattern and whose width is smaller than a width of the first pattern; and a convex portion provided in the first pattern.
申请公布号 US7732817(B2) 申请公布日期 2010.06.08
申请号 US20050213789 申请日期 2005.08.30
申请人 SEIKO EPSON CORPORATION 发明人 HIRAI TOSHIMITSU;USHIYAMA TOSHIHIRO
分类号 H01L29/04 主分类号 H01L29/04
代理机构 代理人
主权项
地址