发明名称 Method for recycling of ion implantation monitor wafers
摘要 A method of recycling monitor wafers. The method includes: (a) providing a semiconductor wafer which includes a dopant layer extending from a top surface of the wafer into the wafer a distance less than a thickness of the wafer, the dopant layer containing dopant species; after (a), (b) attaching an adhesive tape to a bottom surface of the wafer; after (b), (c) removing the dopant layer; and after (c), (d) removing the adhesive tape.
申请公布号 US7732303(B2) 申请公布日期 2010.06.08
申请号 US20080023224 申请日期 2008.01.31
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 CODDING STEVEN ROSS;GRECO JOSEPH R.;KRYWANCZYK TIMOTHY CHARLES
分类号 H01L21/322 主分类号 H01L21/322
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