发明名称 Method for non-contact and diffuse curing exposure for making photopolymer nanoimprinting stamper
摘要 A nanoimprinting configuration includes a UV light diffuser that randomizes a collimated UV light beam so as to diffuse the shadowing effect from any defect object that resides in the UV optical path. In addition, a combination center circular pad and outer ring-shaped pad form a donut-shaped“non-contact”area between the two pad pieces. The size and shape of the two pad combination are designed to avoid direct gel pad contact above the patterned imprint zone on the disk substrate. The purpose of the gel pad, non-contact configuration is to eliminate any possible surface deformation incurred along the loading column and thereby avoid the elastic propagation of any deformations to the stamper resist surface.
申请公布号 US7731889(B2) 申请公布日期 2010.06.08
申请号 US20080061772 申请日期 2008.04.03
申请人 HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.V. 发明人 BANDIC ZVONIMIR Z.;WU TSAI-WEI
分类号 B29C35/08 主分类号 B29C35/08
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