发明名称 SUBSTRATE PROCESSING SYSTEM
摘要 <p>PURPOSE: A substrate processing system is provided to increase the number of processed substrates per unit time by efficiently transferring plural substrates between a substrate processing unit and a substrate receiver which accepts the substrate. CONSTITUTION: A substrate receiver(30) receives plural substrates. A first substrate transferring apparatus(50) transfers the substrate to the substrate receiver before the substrate is processed by a substrate processing unit. The first substrate transferring apparatus takes out the substrate processed by the substrate processing unit from the substrate receiver. Second substrate transferring apparatuses are aligned vertically and installed at a plurality of stages with a certain interval from each other. The second substrate transferring apparatus transfers the substrate between the substrate processing unit and the substrate receiver.</p>
申请公布号 KR20100061336(A) 申请公布日期 2010.06.07
申请号 KR20090107465 申请日期 2009.11.09
申请人 TOKYO ELECTRON LIMITED 发明人 ISHIDA SEIKI
分类号 H01L21/677;H01L21/00 主分类号 H01L21/677
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