发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 PURPOSE: A photosensitive resin composition is provided to have excellent applicability and ink repelling property and to be suitable for forming a lattice structure such as black matrix of a color filter by including polymerizable compound, a photopolymerization initiator, and a fluorosurfactant. CONSTITUTION: A photosensitive resin composition contains a photopolymerizable compound, a photopolymerization initiator, and a fluorosurfactant having a fluorinated alkenyl group and an amphiphilic group in a side chain. The fluorosurfactant is a polymer having an average molecular weight of 5,000~30,000. The fluorinated alkenyl group is a perfluoro alkenyl group. The fluorinated alkenyl group is marked as a chemical formula (c1-1) or (c1-2).
申请公布号 KR20100061341(A) 申请公布日期 2010.06.07
申请号 KR20090108996 申请日期 2009.11.12
申请人 TOKYO OHKA KOGYO CO., LTD. 发明人 TATENO ISAO;SHIDA MASARU;KONDO MITSURU;SHIOTA DAI
分类号 G03F7/027 主分类号 G03F7/027
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