发明名称 FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, SEMICONDUCTOR DEVICE FABRICATION APPARATUS, SUSCEPTOR USED THEREIN, AND COMPUTER READABLE STORAGE MEDIUM
摘要 PURPOSE: A penetrating apparatus, a penetrating method, a semiconductor manufacturing apparatus, a susceptor using the same, and a computer-readable memory medium are provided to create a reaction product on a substrate by implementing a cycle with providing 2 kinds of a reaction gas with reacting each other on the substrate. CONSTITUTION: A substrate transferring arm(10) includes a hooking unit(10a). A susceptor(2) is installed within a container with rotating possibly. A first reaction providing unit provides the first reaction gas on the one side. A second reaction providing unit provides the second reaction gas on the one side. A separating area separated a first processing area and a second processing area(P2). Exhaust pipes(61, 62) exhaust inside of the container.
申请公布号 KR20100061382(A) 申请公布日期 2010.06.07
申请号 KR20090115464 申请日期 2009.11.27
申请人 TOKYO ELECTRON LIMITED 发明人 HONMA MANABU
分类号 H01L21/205;H01L21/00;H01L21/683 主分类号 H01L21/205
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