BRUSH UNIT, SUBSTRATE POLISHING APPARATUS HAVING THE SAME AND METHOD OF CLEANIG SUBSTRATE USING THE SAME

摘要

PURPOSE: A brush unit, a substrate polishing apparatus having the same and a method of cleaning the substrate using the same are provided to clean a substrate through discharging a cleaning solution and clean the brush simultaneously. CONSTITUTION: A substrate polishing apparatus comprises a substrate support member, a polishing unit, and a brush unit(600). The substrate is mounted in the substrate support member. A polishing unit is located at one side of the substrate support member and polishes the substrate mounted in the substrate support member. The brush unit is located at one side of the substrate support member and cleans the substrate mounted in the substrate support member. The brush unit comprises a rotating arm(620) and a brush head(610).