发明名称 |
APPARATUS FOR MAKING SEMICONDUCTOR |
摘要 |
PURPOSE: An apparatus for making semiconductor is provided to remove a by-product attached a protective layer through a dry cleaning method by reducing a contact area through the improvement of a surface luminance. CONSTITUTION: A process gas is supplied to a reaction chamber(14). A vent(29) discharges a process gas of the reaction chamber. A gas discharge path(31) has a thermal spray coating on which is coated with a corrosion resistance oxide film by communicating the reaction chamber and the vent. A polished layer is arranged on a part of the thermal spray coating.
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申请公布号 |
KR20100060336(A) |
申请公布日期 |
2010.06.07 |
申请号 |
KR20080118903 |
申请日期 |
2008.11.27 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
JEON, YUN KWANG |
分类号 |
H01L21/3065;H01L21/02 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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