APPARATUS AND METHOD FOR WASHING POLYCRYSTALLINE SILICON

摘要

PURPOSE: A poly-crystal silicon cleaning device and a cleaning method are provided to clean the poly-crystal silicon by successively dipping the poly-crystal silicon form a first acid bath to a final acid bath. CONSTITUTION: A plurality of acid bathes(2~6) fills an acid. A poly-crystal silicon(S) is cleaned by successively dipping the poly-crystal silicon from a first acid bath to a final acid bath. A solution temperature of later acid bath is established with same solution temperature of former acid bath or low. The final acid bath is established as the lower temperature than the first acid bath. A temperature controller(18) regularly maintains the solution temperature of the acid bath. A liquid transferring means(11) transfers the acid inside of the later acid bath into inside of the former acid bath.