RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR

摘要

PURPOSE: A resist composition, a novel compound used as an acid generator, and the acid generator including the compound are provided to obtain excellent solubility to a developer, to have good lithography properties and a resist pattern. CONSTITUTION: A resist composition contains a base component having solubility to an alkali developer which is varied due to the action of an acid and an acid generator component which creates the acid through exposure. The acid generator component contains an acid generator comprising a compound having a group which is marked as a chemical formula 1 on a cation part. In the chemical formula 1, R_5 is a carbonyl group, an ester bond, or an organic group having a sulfonyl group.