发明名称 |
PROJECTION EXPOSURE APPARATUS, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, ILLUMINATION OPTICAL SYSTEM, AND POLARIZATION UNIT |
摘要 |
<p>A lighting optical device and a projection aligner capable of reducing a light quantity loss when a mask is illuminated with a polarized lighting light. A lighting optical system (ILS) for illuminating a reticle (R) with a lighting light (IL) and a projection optical system for projecting the pattern image of the reticle (R) onto a wafer (W) are provided. A lighting light (IL) emitted from an exposure light source (1) in a linearly polarized state in the lighting optical system (ILS) passes through first and second double- refraction members (12, 13) having different advanced-phase-axis directions and is converted into a polarized state that is substantially linearly polarized in a circumferential direction with the optical axis as the center in an almost specific annular area, and then illuminates the reticle (R) under an annular illuminating condition after passing through a fly-eye lens (14).</p> |
申请公布号 |
KR20100061551(A) |
申请公布日期 |
2010.06.07 |
申请号 |
KR20107008438 |
申请日期 |
2004.10.26 |
申请人 |
NIKON CORPORATION |
发明人 |
SHIRAISHI NAOMASA |
分类号 |
H01L21/027;G02B19/00;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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