发明名称 APPARATUS FOR SENSING SUBSTRATE
摘要 <p>PURPOSE: An apparatus for sensing a substrate is provided to return a rotation unit to an original location using a magnetic force or an elastic force in a substrate unloading process. CONSTITUTION: A sensor(220) is fixed to one side of a body(210). A substrate contacting part contacting with one side of a substrate(S) is located on one side of a rotating unit(230). A sensing part is located on the other side of the rotating unit. The rotating unit rotates about the body to a horizontal direction. A returning unit returns the rotating unit to the original location. The returning unit is a magnet(232) included in the body and the rotating unit respectively.</p>
申请公布号 KR20100059130(A) 申请公布日期 2010.06.04
申请号 KR20080117789 申请日期 2008.11.26
申请人 FNS TECH CO., LTD. 发明人 PARK, WOO YOUL
分类号 H01L21/66;H01L21/677 主分类号 H01L21/66
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