| 摘要 |
PURPOSE: A substrate processing apparatus and an air current supplying method are provided to adjust the amount of the air current without changing the rotation number of the fan by supplying the air current generated by a fan to a chamber through a shutter. CONSTITUTION: A first chamber(110) and a second chamber(120) deal with the process. A fan(130) offers the air current to the first chamber and the second chamber. A first filter(160) filters the air current supplied from the fan and sends the air current to the first chamber. A second filter(170) is arranged between the second chamber and the fan. The second filter filters the air current supplied from the fan and sends the air current to the second chamber.
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