发明名称 |
METHODS FOR NEUTRALIZATION OF ELECTRON BEAM CHARGE IRRADIATED FROM AN ELECTRON BEAM SOURCE |
摘要 |
PURPOSE: A neutralization method of an electron beam electric charge which is radiated from electron beam source is provided to efficiently transfer the energy of electron beam to a non-conductor or semiconductor substrate by neutralizing the electric charge of the electron beam in order to remove a negative charge which is accumulated on the non-conductor or semiconductor substrate. CONSTITUTION: Electron beam is radiated on the surface of a substrate(100) using electron beam source(110). Ion beam is radiated on the surface of the substrate using an ion beam irradiation apparatus(120). An electric charge which is accumulated on the surface of the substrate is neutralized. The substrate is made of a non-conductor or semiconductor substrate.
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申请公布号 |
KR20100059213(A) |
申请公布日期 |
2010.06.04 |
申请号 |
KR20080117901 |
申请日期 |
2008.11.26 |
申请人 |
INFOVION. CO., LTD.;KIM, YONG HWAN |
发明人 |
KIM, YONG HWAN |
分类号 |
H01L21/265 |
主分类号 |
H01L21/265 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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