| 摘要 |
PURPOSE: A substrate support member, a substrate processing apparatus having the same, and a substrate processing method using the same are provided to improve washing efficiency and the product yield rate by adjusting a distance between a vibrating plate and a substrate. CONSTITUTION: A substrate is settled on a support plate. A washing unit(130) is installed on the support plate. The washing unit washes the substrate settled on the support plate by vibrating the washing fluid. The washing unit comprises a vibration plate(131), a back nozzle(133), and an interval controller(134). The vibration plate vibrates using the ultrasonic wave. The back nozzle discharges the washing fluid to the top.
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