| 摘要 |
PURPOSE: A single wafer type substrate processing apparatus is provided to prevent the generation of vortex by guiding the air current using a guide member guiding clean air. CONSTITUTION: A treatment basin(100) is installed within a chamber(60). An exhaust member treats the ventilation of the treatment basin. A pressure control member(500) controls the inner pressure of the treatment basin. The pressure control member comprises a fan filter unit, a guide member, and a controller. The fan filter unit blows the clean air to the top of the substrate with a constant pressure.
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