摘要 |
PURPOSE: A metal wiring forming method is provided to prevent the under cut which is generated during the etching of aluminum by improving an etching condition of a reflection prevention layer. CONSTITUTION: A metal stack(200) is formed by laminating an adhesion material(210), an aluminum(230), and a reflection prevention material(250) sequentially. A nitride film(300) is formed on the top of the metallic stack. A photoresist(400) is spread on the top of the nitride film. The nitride film, the reflection prevention material, and the aluminum and adhesion material are sequentially etched. The photoresist is striped.
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