发明名称 |
APPARATUS AND METHOD FOR TREATING SUBSTRATE |
摘要 |
PURPOSE: A substrate processing apparatus and a substrate processing method are provided to efficiently eliminate static electricity on the substrate using a photo ionizer as an ion generator. CONSTITUTION: A process chamber progresses a substrate processing process. An ion generator(429) supplies an ion to the substrate loaded on the process chamber. The ion generator neutralizes the static electricity charged on the substrate. The ion generator creates the ion by radiating X-rays. The ion generator is installed in upper and lower cleaning chambers(420,440) of cleaning units. The ion generator is a photo ionizer to neutralize the charged static electricity on the substrate.
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申请公布号 |
KR20100059354(A) |
申请公布日期 |
2010.06.04 |
申请号 |
KR20080118099 |
申请日期 |
2008.11.26 |
申请人 |
SEMES CO., LTD. |
发明人 |
WON, SUNG BUM;KANG, BYUNG MAN |
分类号 |
H01L21/00;H01L21/02 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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