发明名称 |
Resist composition, method of forming resist pattern, novel compound, and acid generator |
摘要 |
A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) containing a compound having a cation moiety represented by general formula (I) (in the formula, R5 represents an organic group having a carbonyl group, an ester bond or a sulfonyl group; and Q represents a divalent linking group).
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申请公布号 |
US2010136478(A1) |
申请公布日期 |
2010.06.03 |
申请号 |
US20090591639 |
申请日期 |
2009.11.25 |
申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
KAWAUE AKIYA;UTSUMI YOSHIYUKI;HADA HIDEO;SESHIMO TAKEHIRO;MATSUZAWA KENSUKE;ISHIDUKA KEITA;ENDO KOTARO |
分类号 |
G03F7/20;C07D327/04;C07D333/50;G03F7/004 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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