| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a substrate for a mask blank suitable as a substrate for a reflective mask blank which is requested to have defect quality of extremely high level by decreasing the number of projection-shaped defects. <P>SOLUTION: Provided is the method for manufacturing the substrate for the mask blank in which a low thermal expansion glass substrate containing titanium (Ti) oxide is polished using a polishing agent, then treated using an aqueous solution containing hydrofluoric acid, then cleaned using an acidic solution with a pH of 4 or less, and then further cleaned using an alkaline solution. <P>COPYRIGHT: (C)2010,JPO&INPIT |
