| 发明名称 |
COPPER (I) COMPOUNDS USEFUL AS DEPOSITION PRECURSORS OF COPPER THIN FILMS |
| 摘要 |
Copper (I) amidinate precursors for forming copper thin films in the manufacture of semiconductor devices, and a method of depositing the copper (I) amidinate precursors on substrates using chemical vapor deposition or atomic layer deposition processes.
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| 申请公布号 |
US2010133689(A1) |
申请公布日期 |
2010.06.03 |
| 申请号 |
US20090464088 |
申请日期 |
2009.05.11 |
| 申请人 |
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发明人 |
XU CHONGYING;BOROVIK ALEXANDER;BAUM THOMAS H. |
| 分类号 |
H01L23/52;B05D5/12;C07C257/14;C07F1/08;C23C16/00;C23C16/18;H01L21/768 |
主分类号 |
H01L23/52 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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