发明名称 NOVEL LAYOUT ARCHITECTURE FOR PERFORMANCE ENHANCEMENT
摘要 PROBLEM TO BE SOLVED: To provide an integrated circuit having a novel layout architecture for enhancing performance. SOLUTION: This integrated circuit includes: an active region 102 in a semiconductor substrate; a field effect transistor 108 disposed in the active region, and including a first gate 114, a first source 116 formed in the active region and disposed in a first region adjacent to the first gate, and a first drain 118 formed in the active region and disposed in a second region adjacent to the first gate; and an isolation structure disposed in the active region, and including an isolation gate 140 disposed adjacently to the first drain, and an isolation source 142 formed in the active region, and disposed adjacently to the isolation gate such that the isolation source and the first drain are located on different sides of the isolation gate. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010123947(A) 申请公布日期 2010.06.03
申请号 JP20090254112 申请日期 2009.11.05
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD 发明人 KO EISEI;GUO TA-PEN;SHO GAKURI;DIAZ CARLOS H;LU LEE-CHUNG;TIEN LI-CHUN;RA MINKEN;CHO SHIKYO;TAI CHUN-HUI;LEE HOSHO
分类号 H01L21/82;H01L21/822;H01L21/8238;H01L27/04;H01L27/08;H01L27/092 主分类号 H01L21/82
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