METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE, SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND REACTION APPARATUS

摘要

Disclosed is a method wherein a semiconductor substrate is produced by heat-treating a base substrate that comprises a portion to be heat-treated, said portion being subjected to a heat treatment.  The method for producing a semiconductor substrate comprises: a step wherein a portion to be heated is formed on the base substrate, said portion to be heated absorbing electromagnetic waves and generating heat, thereby selectively heating the portion to be heat-treated; a step wherein the base substrate is irradiated with electromagnetic waves; and a step wherein the lattice defect density in the portion to be heat-treated is decreased by the heat that is generated when the portion to be heated absorbs electromagnetic waves.