发明名称 METHOD OF FORMING PATTERN AND PROGRAM
摘要 PROBLEM TO BE SOLVED: To suppress the occurrence of failure caused by unfilling of resin when forming a pattern by using a nano-imprint method of dropping the resin on a substrate by an inkjet method. SOLUTION: In the step of calculating the quantity of the resin to be dropped on the substrate that includes dividing the pattern into a plurality of regions (S1), calculating the quantity of the resin required for forming the pattern relative to each of the plurality of the regions (S2), and curing the resin, there are provided the steps of: determining whether the resin quantity calculated in a recess of the template is filled within a predetermined time with respect to each of the plurality of the regions (S3); and in the determining step, correcting the quantity of the resin to be dropped on the substrate so that the resin is filled in the recess within the predetermined time with respect to the region where the resin is determined not to be filled in the recess within the predetermined time (S4). COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010123757(A) 申请公布日期 2010.06.03
申请号 JP20080296050 申请日期 2008.11.19
申请人 TOSHIBA CORP 发明人 OTA TAKUMI;YONEDA IKUO
分类号 H01L21/027;B29C59/02 主分类号 H01L21/027
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