METHODS AND SYSTEMS FOR PREVENTING FEATURE COLLAPSE DURING MICROELECTRONIC TOPOGRAPHY FABRICATION
摘要
Methods and systems for preventing feature collapse subsequent to etching include adding a rinse liquid to a microelectronic topography having remnants of another rinse liquid arranged upon its surface and subsequently exposing the topography to a pressurized chamber including a fluid at or greater than critical pressure. The methods include flushing from the pressurized chamber liquid arranged upon the topography and, thereafter, venting the chamber in a manner sufficient to prevent liquid formation therein.
申请公布号
WO2010036575(A3)
申请公布日期
2010.06.03
申请号
WO2009US57490
申请日期
2009.09.18
申请人
LAM RESEARCH CORPORATION;WAGNER, MARK, I.;DEYOUNG, JAMES, P.;KROEKER, TONY, R.
发明人
WAGNER, MARK, I.;DEYOUNG, JAMES, P.;KROEKER, TONY, R.