| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a photomask blank, for improving the light fastness of a phase shift film or light-shielding film for an exposure light having a wavelength of 200 nm or less, and for improving the lifetime of the photomask. <P>SOLUTION: The method for manufacturing the photomask blank includes forming a thin film for forming a transfer pattern on a light-transmissive substrate to prepare a thin-film coated substrate and then pressing the thin-film coated substrate. The pressing process is carried out, for example, by a cold isostatic pressing method in a range of 1,000 to 10,000 atmospheric pressure. <P>COPYRIGHT: (C)2010,JPO&INPIT |
