RESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, NEW COMPOUND, AND ACID GENERATOR

摘要

PROBLEM TO BE SOLVED: To provide a compound suitable as an acid generator for resist compositions, to provide an acid generator consisting of the compound, to provide such a resist composition containing the acid generator, and to provide a resist pattern-forming method.

SOLUTION: The compound is represented by general formula (b1-15). The acid generator consists of the compound. The resist composition includes a base material component varying in solubility to an alkali developer solution by the action of an acid and the acid generator consisting of the compound. In the general formula (b1-15), at least one of R7"to R9"is a substituted aryl group substituted with a functional group represented by general formula (b15-1).

COPYRIGHT: (C)2010,JPO&INPIT