| 摘要 |
PROBLEM TO BE SOLVED: To provide an ion implantation device setting the central position of an ion beam incident on a target to a desired position while maintaining the incident angle of the ion beam incident on the target at a desired angle so as not to greatly change a deflection central position even in acceleration/deceleration, in particular, in deceleration of the ion beam. SOLUTION: In the ion implantation device with an electrostatic accelerating tube 3 for accelerating/decelerating and deflecting the ion beam IB to be incident on the target T, a deflection electrode 5 constituting a part of the electrostatic accelerating tube 3 includes a first deflection electrode 51 and a second deflection electrode 52 which are disposed with the ion beam IB interposed and set at different potentials. The second deflection electrode 52 is disposed on a side toward which the ion beam IB is deflected and includes an upstream electrode 521 disposed upstream and a downstream electrode 522 disposed apart from the upstream electrode. The upstream and downstream electrodes are configured such that their potentials can be set independently. COPYRIGHT: (C)2010,JPO&INPIT
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