发明名称 THIN FILM DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To form an oxide semiconductor TFT having a fine property, which can be utilized for driving elements of a display, on an inexpensive glass substrate or a resin substrate such as PET that is light and flexible with fine regenerability and yield. SOLUTION: Through irradiating an oxide semiconductor with pulse light, a fine-quality oxide semiconductor film 4 can be formed on the glass substrate 21 or the resin substrate 1 such as PET. This makes it possible to manufacture thin film devices having a fine property with fine regenerability and yield. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010123758(A) 申请公布日期 2010.06.03
申请号 JP20080296068 申请日期 2008.11.19
申请人 NEC CORP 发明人 NAKADA MITSURU;TAKECHI KAZUE
分类号 H01L29/786;H01L21/26;H01L21/268;H01L21/324;H01L21/336 主分类号 H01L29/786
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