OPTICAL CHARACTERISTIC MEASURING METHOD, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING DEVICE

摘要

PROBLEM TO BE SOLVED: To shorten measurement time of optical properties of projection optical system.

SOLUTION: The position data of Z axis direction parallel to an optical axis AX of slit board 190 and intensity data of projection image (spatial image) of measurement mark PM formed on a reticle Rm for measurement by the projection optical system PL (that is, the intensity data of illumination light IL passing through a slit 122 of slit board 190) are measured while the slit board 190 is driven from one side to the other side (or from the other side to one side) in parallel to the optical axis AX of a projection optical system PL. This shortens the time required for the measurement of optical characteristics of projection optical system, compared to the conventional measurement method of aerial image where a slit board is driven back and forth in upward and downward directions from an initial position as a center.

COPYRIGHT: (C)2010,JPO&INPIT