| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of efficiently removing an anti-corrosive for azole-based copper in anti-corrosive-containing water for the azole-based copper such as waste water in the CMP step of a semiconductor device manufacturing process. SOLUTION: Ferrous ion is added into water containing the anti-corrosive for the azole-based copper to separate a produced insoluble iron-azole-based complex. After the insoluble iron-azole-based complex is separated, a residual TOC component is degraded with ozone. The anti-corrosive for the azole-based copper is efficiently made insoluble as the iron-azole-based complex and flocculated and solid-liquid separated by the addition of the ferrous ion. Water after the removal of the insoluble material produced by the addition of ferrous ion is obtained by removing not only the anti-corrosive for the azole-based copper but a suspension and in the acceleration oxidation degradation by ozone, the futile use of ozone is prevented and a remaining TOC component containing the anti-corrosive for the azole-based copper is highly decomposed and removed with a small injected ozone. COPYRIGHT: (C)2010,JPO&INPIT |
