发明名称 |
DETERMINING ENDPOINT IN A SUBSTRATE PROCESS |
摘要 |
An endpoint detection system for detecting an endpoint of a process comprises a polychromatic light source which emits polychromatic light. The light is reflected from a substrate. A light wavelength selector receives the reflected polychromatic light and determines a wavelength of light at which a local intensity of the reflected light is maximized during the process. In one version, the wavelength selector comprises a diffraction grating to generate a plurality of light beams having different wavelengths from the reflected polychromatic light and a light detector to receive the light beams having different wavelengths and generate an intensity signal trace of the intensity of each wavelength of the polychromatic reflected light.
|
申请公布号 |
US2010133232(A1) |
申请公布日期 |
2010.06.03 |
申请号 |
US20100688840 |
申请日期 |
2010.01.15 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
LIAN LEI;DAVIS MATTHEW F. |
分类号 |
G01B11/02;G01B11/06;H01J37/32;H01L21/306 |
主分类号 |
G01B11/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|