发明名称 OPTICAL WAVE INTERFERENCE MEASURING APPARATUS
摘要 PROBLEM TO BE SOLVED: To measure with high accuracy the shape of a test surface that is rotationally symmetric and has a complicated shape by optical interferometry. SOLUTION: The relative position of the test surface 80 is sequentially changed from a reference position where a surface axis C is aligned with a measurement optical axis L so that the measurement optical axis L is sequentially moved to a plurality of annular regions obtained by dividing the test surface 80 in a radial direction. The test surface 80 is rotated around a rotation axis E whenever the relative position is changed. Measurement light that travels while being converged by a Mirau objective interference optical system 23 is applied to the rotating test surface 80, and a one-dimensional image sensor 32 captures interference fringes at each of a plurality of rotational positions. The shape information of each annular region is determined on the basis of the captured interference fringes at each rotational position, and pieces of the shape information are connected to determine the shape information of the entire measurement region. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010122206(A) 申请公布日期 2010.06.03
申请号 JP20090207890 申请日期 2009.09.09
申请人 FUJINON CORP 发明人 KATSURA SOUTO;KANDA HIDEO;SAITO TAKAYUKI;KOIZUMI NOBORU
分类号 G01B9/02;G01B11/24;G01M11/00 主分类号 G01B9/02
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