METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE, SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND REACTION APPARATUS

摘要

Disclosed is a method wherein a semiconductor substrate is produced by heat-treating a base substrate that comprises a part to be heat-treated, which has a single crystal layer and is subjected to a heat treatment, and a part to be protected, which is protected from the heat applied during the heat treatment.  The method for producing a semiconductor substrate comprises a step wherein a protective layer is formed on top of the part to be protected for the purpose of protecting the part to be protected from an electromagnetic wave irradiated onto the base substrate, and a step wherein the part to be heat-treated is annealed by irradiating the whole of the base substrate with an electromagnetic wave.