METHOD FOR FORMING NANO STRUCTURE, NANO STRUCTURE AND DEVICE USING THE SAME

摘要

PURPOSE: A method for manufacturing nanostructures is provided to obtain nanostructures having an increased surface area by etching the surface of the nanostructures and to improve the efficiency and sensitivity of a device by using the nanostructures in the device. CONSTITUTION: A method for manufacturing nanostructures consists of etching the external side of nanostructures by offering hydrogen ions to the nanostructures(1), including a piezoelectric material. The nanostructure is etched by being contacted with a basic solution. The method for manufacturing the nanostructures comprises an etching process which controls the concentration and temperature of the basic solution and etching time. The etching process is performed at 100°C or less.