| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of surely preventing the leakage of the atmosphere in a processing chamber to outside and easily performing the maintenance of the processing chamber from outside. <P>SOLUTION: In the substrate processing apparatus, a coating process chamber 21 has an opening 21z formed by a frame including a longitudinal frame Fa. In the frame, a maintenance door D is installed so as to open and close the opening 21z. A grooved trim 501 is so installed on the frame as to surround the opening 21z. The grooved trim 501 has a groove 501g facing the maintenance door D by contacting the maintenance door D in the state where the opening 21z is closed by the maintenance door D. In the state where the opening 21z is closed by the maintenance door D, the atmosphere in the space formed by the groove 501g of the grooved trim 501 and the maintenance door D is sucked by a suction unit. The space inside of the groove 501g is maintained in a negative pressure against the outside. <P>COPYRIGHT: (C)2010,JPO&INPIT |
