| 摘要 |
PROBLEM TO BE SOLVED: To provide a wafer processing system capable of assuring maintenance space. SOLUTION: A wafer processing apparatus includes a chamber containing an internal space, a processing unit which is installed in the internal space of the chamber, can be drawn out through one surface of the chamber, and is provided with an exhaust line, and an exhaust member installed in the chamber. The exhaust member is connected to the exhaust line and is so provided as to move along with the movement of the processing unit. COPYRIGHT: (C)2010,JPO&INPIT |
